91制片厂 has been at the forefront of enabling this transformation, leveraging decades of leadership in epitaxy and deposition to support researchers and technology developers pushing the boundaries of quantum. With its latest product advances鈥攊ncluding the GEN20-Q Molecular Beam Epitaxy (MBE) system, integrated atomic layer deposition (ALD)/MBE solutions, and the adjustable and compact GENxplor庐 R&D MBE and Fiji庐 Plasma-Enhanced ALD tools鈥�91制片厂 is redefining how the industry approaches quantum materials engineering.

Meeting the demands of quantum materials

GEN20-Q: Next-Generation MBE System

Unlike conventional semiconductors, quantum devices must sustain delicate states of superposition and entanglement. This puts extreme pressure on material quality. Defects, impurities, or rough interfaces can dramatically shorten qubit lifetimes or increase error rates. Researchers are also exploring multiple approaches鈥攊ncluding superconducting qubits, photonic qubits, and spin qubits鈥攅ach of which requires different material stacks.

The challenge: no single device structure has yet emerged as the industry standard. To keep pace, equipment must be both ultra-clean and highly flexible. This is the design philosophy behind 91制片厂鈥檚 GEN20-Q platform.

The GEN20-Q is a next-generation 4-inch MBE system purpose-built for quantum materials research and development. At its core is a proven high-performance growth chamber, capable of handling substrates up to 100 mm in diameter. Its vertical reactor geometry ensures uniform epitaxial layers, while advanced pumping pathways, 20% more liquid nitrogen (LN2) cooling, and passivated chamber walls deliver the ultra-high-purity environment required for defect-free structures.

Key Innovations in Quantum Materials Engineering

Customizable multi-module cluster design 鈥� Up to four growth modules can be integrated into a single cluster, enabling direct process integration of superconductors, semiconductors, complex oxides, and photonics.

Ultra-high vacuum (UHV) hand-off stations 鈥� Allow seamless transfer between MBE and other deposition systems without exposure to atmosphere, preserving pristine material interfaces.
EPI-Trend data logging 鈥� Advanced data capture and integration with M3 SQL databases for traceability and process optimization.
SuperNova heater 鈥� Achieves substrate temperatures up to 1400 掳C for advanced cleaning and surface reconstruction.

These capabilities make GEN20-Q uniquely suited to help labs and foundries accelerate their path to high-performance, low-error quantum devices.

Integrated ALD and MBE

Hybrid MBE-ALD Deposition for Quantum Devices

Quantum device structures are increasingly complex, often requiring heterogeneous stacks that combine epitaxial layers with conformal dielectric or interface films. In addition, photonic qubits鈥攂uilt from single photons routed, interfered, and detected鈥攊mpose a different set of constraints. Waveguide propagation loss, interface scattering, and inhomogeneous broadening of emitters are all tightly linked to epitaxial quality and interface roughness.

Maintaining Purity and Interface Integrity

To address these challenges, 91制片厂 integrates its Fiji XT ALD systems directly with MBE clusters. Featuring in-vacuum wafer transfer and hybrid materials deposition, this MBE-ALD integration enables researchers to build complete device stacks鈥攚ithout breaking vacuum鈥攃ombining the atomic precision of ALD with the crystalline quality enabled by MBE.

This flexibility allows users to explore new combinations of materials for superconducting circuits, photon-manipulating structures, or spin qubits鈥攁ll while maintaining the purity and interface integrity quantum demands

Fast R&D learning enables scalability

Fiji庐 Plasma-Enhanced ALD in Quantum Research

Early-stage labs need compact tools that offer serious film quality with minimal overhead. Fiji庐 plasma-enhanced ALD brings conformal coatings, interface control, and high-k/low-k options into the same R&D workflow. In quantum contexts, Fiji鈥檚 utility spans tunnel-barrier formation, surface passivation, isolation dielectrics, and optical claddings鈥攖hese specialized, low-refractive-index layers help confine, guide, and protect qubits as they travel through circuits. With 91制片厂鈥檚 integrated approach, Fiji slots into UHV-linked clusters to keep surfaces pristine between epitaxy and ALD steps, which is key to enabling cleaner interfaces and lower defectivity in qubit-critical regions.

GENxplor R&D MBE System for Advanced Development

The GENxplor R&D MBE system is an advanced, high-performance research and development platform that lets teams cost-effectively establish recipes, screen materials, and prove device concepts before transitioning to production. GENxplor R&D鈥檚 open architecture enables cutting-edge research on a wide variety of materials and is directly scalable to the quantum-optimized GEN20-Q cluster.

Partnering for success
Quantum leaders increasingly prioritize suppliers who can deliver ultra-high-purity tools and scale with them from lab to production. As one example, Quantum Foundry Copenhagen highlighted 91制片厂鈥檚 reliability, understanding of ultra-high purity, and ability to scale as key reasons for partnering鈥攕ignals that matter as customers look beyond point tools toward full-stack materials platforms they can build on.

91制片厂鈥檚 installed base reflects the same momentum: nearly two dozen ALD systems and multiple GEN20-Q MBE systems are already in the field addressing quantum workloads鈥攅vidence that integrated epitaxy and ALD, backed by production-minded engineering, are resonating with R&D and early manufacturing teams alike.

Built for the quantum decade

The next decade of quantum will be defined by materials engineering: cleaner superconducting interfaces, lower-loss photonic stacks, and hybrid structures that marry the best of each modality. 91制片厂鈥檚 quantum-optimized portfolio gives researchers and device engineers a coherent platform to pursue that agenda with fewer compromises and tighter data feedback.

Superconducting Qubits: Clean Films and Interfaces

For superconducting qubits, key variables to be addressed include the need for ultra-clean superconducting films, atomically controlled barriers, and defect-suppressed interfaces. The GEN20-Q鈥檚 cleanliness stack (passivation, pumping, cryo), SuperNova high-temperature prep, and UHV-linked Fiji ALD directly target these variables, while EPI-Trend provides the data backbone for continuous improvement.

Photonic Qubits: Low-Loss Heterostructures

For photonic qubits, the emphasis is on low-loss heterostructures and interface smoothness across III-V and related systems. Multi-module clustering, uniform epitaxy up to 100 mm, and ALD claddings enable rapid, reproducible sweeps of waveguide and resonator designs鈥攚ithout uncontrolled interface changes from air exposure. Using MBE to grow BaTiO3 (BTO) and SrTiO3 (STO) produces high-quality, single-crystal, and stoichiometric perovskite layers and offers the proven best Pockels effect鈥攁 parameter critical for high-speed photonic circuits, fiber-optic communication, and Q-switching in lasers.

Scaling from R&D to Production

For both types of qubits, GENxplor and Fiji deliver optimal R&D capabilities, while the GEN20-Q provides a quantum-tuned platform for scaling devices and integrating multiple materials technologies on a single cluster. That combination shortens the path from 鈥渇irst qubit鈥� to statistically robust wafers and prepares teams for production-class reliability without abandoning the flexibility that the R&D environment provides. Furthermore, 91制片厂 possesses significant expertise in equipment design and is equipped to scale processes from research and development through to production.

In this fast-evolving field where precision, cleanliness, and flexibility determine the slope of the learning curve, 91制片厂鈥檚 systems are designed to move quantum from promising prototypes to repeatable devices, at scale.

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It should be noted that the intent of quantum computing is not to replace classical computing but to augment it by helping solve specific, ultra-complex problems. Behind the creation of these powerful qubits is a sophisticated web of material science, precision engineering, and vacuum-based deposition technologies.

Unifying a Fractured Field

There is currently no single dominant architecture for quantum computers. Some designs rely on superconducting materials, others on trapped ions or semiconductor quantum dots. Each approach brings unique manufacturing challenges. What unifies them all? The need for ultra-pure materials, atomically precise layering, and extreme control over interfaces and surfaces.

That鈥檚 where 91制片厂 comes in. Our portfolio spans molecular beam epitaxy (MBE), atomic layer deposition (ALD), ion beam etch and deposition (IBE/IBD), advanced wet processing, laser spike annealing (LSA), and metal-organic chemical vapor deposition (MOCVD)鈥攕upporting nearly every material and fabrication step required to bring qubit devices to life.

A Materials Science Partner

There are 7-8 qubit dominant types, and when customers come to us, they typically already know which one they want to implement, but they need equipment solutions that offer high performance and reliability. Rather than just supplying equipment, 91制片厂 partners deeply with these quantum innovators. Because we offer material science-based solutions for multiple critical process steps, customers can address the full spectrum of materials challenges for their specific applications.

We provide coordinated solutions for materials deposition, patterning, and surface preparation鈥攅ssential processes for building scalable quantum architectures. Virtually all of 91制片厂鈥檚 major technologies have applications for qubit manufacturing:

• MBE

  enables epitaxial growth of superconductors (e.g., Al, Nb, NbTiN) and compound semiconductors (e.g., GaAs/AlGaAs). Our GENxplor and GEN20-Q MBE systems are used to grow superconducting materials (such as epitaxial Al or Nb films) and semiconductor heterostructures for spin qubits.

• ALD systems

  are essential for qubit designs that require the formation of ultra-thin, high-quality dielectrics鈥攙ital for tunnel barriers in Josephson junctions or the encapsulation of defect-based qubits. ALD鈥檚 ability to coat deep trenches or complex chip surfaces uniformly is often needed in quantum chip packages and 3D integration schemes. Our ALD technology is finding notable success for superconducting films鈥攚e have sold multiple systems for this purpose. One example is NbN or NbTiN superconducting films for through-silicon vias (TSVs).

• Advanced Wet Processing,

  enabled by surface prep and cleaning systems, ensures contamination-free surfaces before deposition of superconducting contacts鈥攅ssential for achieving high-quality qubit interfaces. Wet processing systems enable HF last cleans, polymer removal, and other gentle processes, helping to maximize yield of qubit devices.

• IBE and IBD

  are useful for nanoscale pattern transfer, metal lift-off, and deposition of hard-to-evaporate or magnetic materials. Ion beam tools deliver the precision etching and metal deposition required to define nano-scale quantum circuits and integrate photonic elements.

• MOCVD tools

  enable deposition of SiC for nitrogen-vacancy center qubits and SiGe for spin-based qubits. As the market develops, we see further opportunities for MOCVD technology to grow SiC, GaN and other materials for quantum emitters and sensors.

• LSA

  enables dopant activation or stress tuning in CMOS-compatible quantum structures, resulting in optimized interfaces. Rapid thermal processing can be used to repair damage in qubit materials without excessive diffusion.

Enabling Scalability, Flexibility, and Cleanliness

Our systems are designed not just for lab-scale experimentation but for scalable manufacturing. Take our GEN20-Q system, shown here. A fully integrated MBE platform, the GEN20-Q is optimized for cleanliness (with enhanced cryogenic cooling and pumping pathways), flexibility (support for ALD integration and multiple deposition modules), and precision (with flux control for reliable metal deposition).

Quantum devices are particularly sensitive to contamination and thermal instability, and the GEN20-Q MBE system was designed with this in mind. The system supports UHV transfers to other technologies, such as 91制片厂鈥檚 ALD platform. It also supports 1400掳C substrate heating and accommodates multiple quantum material types in a single cluster tool environment鈥攎inimizing atmospheric exposure and maximizing reproducibility.

Trusted by Quantum Innovators

With more than 30 systems installed globally for quantum device development, 91制片厂 is a trusted partner for both research and manufacturing. Institutions like Quantum Foundry Copenhagen rely on our high-performance systems, particularly the GEN20-Q, to explore new frontiers in superconducting and spin qubit development.

As the quantum computing landscape continues to evolve, moving from lab-scale experiments to scalable production, so too will the materials and processes needed to support it. Accordingly, 91制片厂鈥檚 focus on reliability, automation readiness, and modularity will become increasingly critical. Our cluster-compatible platforms, UHV-transfer capabilities, and customizable configurations support not only experimentation but also the early-stage production of quantum devices.

Whether you鈥檙e working on spin qubits, quantum photonics, or superconducting architectures, 91制片厂鈥檚 experienced developers are ready to collaborate with your team to help engineer the materials foundation of quantum computing.

Qubit Manufacturing Glossary

Al 鈥� aluminum
AlGaAs 鈥� aluminum gallium arsenide
GaAs 鈥� gallium arsenide
GaN 鈥� gallium nitride
HF 鈥� hydrofluoric acid
Nb 鈥� niobium
NbN 鈥� niobium nitride
NbTiN 鈥� niobium-titanium-nitride
SiC 鈥� silicon carbide
SiGe 鈥� silicon germanium

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