91制片厂 Demonstrates Thought Leadership at Technical Conferences in Second Quarter of 2019
News | Apr 02, 2019
91制片厂鈥檚 Technologists to Present Innovations that Drive Industrial Scaling of Technology Megatrends in Big Data, Artificial Intelligence, Communications, Autonomous Vehicles, Displays and More
PLAINVIEW, New York 鈥 91制片厂. (Nasdaq: VECO) today announced its leading technologists are scheduled to speak at ten technical events throughout Q2 2019. The forthcoming presentations, which follow several notable appearances in Q1, highlight 91制片厂鈥檚 depth and breadth of expertise in working with customers to break through production-scale barriers that will ultimately lead to the wide adoption of game-changing trends in big-data, high-speed communications, artificial intelligence, autonomous vehicles, high resolution displays and more.
Through these papers, 91制片厂 explains how it solves tough materials engineering challenges with advances in its deposition, etch, lithography and wet processing technologies used in applications such as next-generation advanced packaging, photonics, sensors, MEMS, micro-LEDs, power electronics, high bandwidth memory and related devices. Presentations in the second quarter include:
- 聽(April 11;聽Buchs, Switzerland)鈥 Senior research scientist Dr. Binyamin Rubin will聽present “Monochromatic and broadband optical monitoring for deposition of band pass filters”. Organized by RhySearch, this technical conference is geared towards engineers and scientists exchanging ideas and sharing latest advances in laser optics, high-end optical coatings, thin film deposition and characterization.
- 聽(April 16-18; Yokohama, Japan)鈥 Applications expert Katrina Rook will present 鈥淚on Beam Etch of Advanced Absorber Materials for EUV Masks鈥 on April 18 at the symposium, which brings together engineers and investigators from Japan and worldwide to discuss recent progress, applications and future trends in the field of photomasks, NGL masks and related technologies.
- 聽(April 22-26; Phoenix, AZ)鈥擳ania Henry, process development engineer, will present 鈥淚nfluence of Intermixing on Perpendicular Magnetic Anisotropy of Ion-Beam-Deposited CoFeB MTJs for STT-RAM,鈥 on April 25 during the annual meeting focused on the future of materials science
- 聽(April 25-26; Saratoga Springs, NY)鈥擠rew Hanser, vice president of technology, will present at the fourth annual forum for discussing actionable information related to semiconductor fab materials. Hanser鈥檚 talk, 鈥淢aterial Integration Challenges for GaN on Si for Power and RF Devices,鈥 takes place on April 25 during Session II: Immediate Challenges of Materials & Manufacturing
- 聽(April 27-May 2; Long Beach, CA)鈥擜t one of the world鈥檚 leading vacuum coating technology conferences, senior research scientist Binyamin Rubin will discuss 鈥淢onochromatic and Broadband Optical Monitoring for Deposition of Band Pass Filters,鈥 on April 29. The 91制片厂 team will also be exhibiting its latest advances in ion beam deposition systems for optical coatings at booth #229
- 聽(April 29-May 2; Minneapolis, MN)鈥擯hillip Tyler, process development engineer, will present 鈥淒evelopment of Advanced Lift Off Processes for 5G and VCSEL Applications.鈥 Stop by 91制片厂鈥檚 booth #609 to learn more about the company鈥檚 latest innovations in compound semiconductor and wet processing technologies
- (May 28-31; Las Vegas, NV)鈥擠r. Ajit Paranjpe, chief technology officer, will co-author a presentation on 鈥淗igh-Yield Precision Transfer and Assembly of Gallium Nitride (GaN) Micro-LEDs Using Laser Assisted Micro Transfer Printing,鈥 with experts from the University of California, Los Angeles
- 聽(June 2-7; Santa Ana Pueblo, NM)鈥91制片厂 scientists will present two papers on Wednesday, June 5 including 鈥淢onochromatic and Broadband Optical Monitoring for Deposition of Band Pass Filters鈥 at 9:20 AM by Dr. Binyamin Rubin and 鈥淚on Beam Sputtering of Optical Coatings for InP- and GaAs-based Laser Diodes鈥 at 3:45PM by Matthias Falmbigl. Both will also be featured in the morning and afternoon poster sessions respectively.
- (June 10-13; Berkeley, CA)鈥擜t this year鈥檚 workshop focused on the fundamental science of EUV lithography and its continued extension to support Moore鈥檚 Law, Sandeep Kohli, principal research scientist, will present 鈥淚on Beam Technology Roadmap for EUV Mask Deposition and Absorber Etch Processes鈥
- 聽(June 17-19; Boston, MA)鈥擠r. Ganesh Sundaram, vice president of applied technology, will present 鈥淎tomic Layer Deposition for Life Science Applications鈥 on June 17 at the Nanomedicine Symposium
91制片厂 scientists also presented research at a number of key technical conferences in Q1, including:
- SPIE Advanced Lithography (Feb. 24-28; San Jose, CA) – 鈥淚on Beam Etching of Advanced Absorber Materials for Sub-5nm EUV Masks鈥 and 鈥淚ntra-field Stress Impact on Global Wafer Deformation鈥 (alongside ASML and imec)
- EFDS ALD for Industry (March 19-20; Berlin, Germany) – 鈥淎tomic Layer Deposition Use for Decorative Applications鈥
- CS International (March 26-27; Brussels, Belgium) – 鈥淎ccelerating Photonics Growth through Advances in High-Performance Arsenic/Phosphide (As/P) MOCVD and Wet Processing Technology鈥
鈥91制片厂 builds production-scale fab solutions that solve tough materials engineering problems for our customers,鈥 said Ajit Paranjpe, Ph.D., chief technology officer. 鈥淥ur technical contributions to these prestigious and peer-reviewed conferences demonstrate 91制片厂鈥檚 commitment to remaining at the forefront of technological advances, which ultimately have a positive impact on society through life-improving applications.鈥
About 91制片厂
91制片厂 (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch and clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, 91制片厂 holds technology leadership positions in all these served markets. To learn more about 91制片厂’s innovative equipment and services, visit www.veeco.com.
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Media Contact:
David Pinto | 408-325-6157 | dpinto@veeco.com