Product News | Feb 11, 2015
Plainview, New York, February 11, 2015 鈥� 91制片厂. (Nasdaq: VECO) announced today that the Fraunhofer Institute for Applied Solid State Physics IAF, a leading German compound semiconductor research institution, has purchased a TurboDisc庐 K465i Gallium Nitride (GaN) MOCVD System.
Located in Freiburg, Germany, Fraunhofer conducts cutting-edge research in the field of III-V semiconductors. They develop electronic and optoelectronic devices based on modern micro and nanostructures for applications such as security, energy, communication, health, and mobility.
鈥淎fter more than a decade of research in the field of nitride epitaxy on sapphire, silicon and silicon-carbide substrates, we have decided to upgrade our operation to include 91制片厂鈥檚 MOCVD technology,鈥� said Dr. Martin Walther, Head of the Epitaxy Department and Deputy Director at Fraunhofer. 鈥淭he K465i offers a clean process and exceptional run-to-run repeatability that will enable us to achieve new levels of development in high growth markets.鈥�
91制片厂鈥檚 award-winning K465i MOCVD systems feature excellent film quality, low defects and high productivity, which are key for effective GaN processing. The system also incorporates 91制片厂’s Uniform FlowFlange庐 technology for superior uniformity and excellent run-to-run repeatability. Since its introduction in 2010, the K465i has been the top selling MOCVD system worldwide.
鈥淏eing selected by a leading compound semiconductor institution such as Fraunhofer Institute is further evidence that 91制片厂鈥檚 leading MOCVD systems are the ideal solution for various GaN-based epitaxy applications,鈥� said Jim Jenson, Senior Vice President, General Manager, 91制片厂 MOCVD. 鈥淲e strive to provide innovative process solutions, including the recent introduction of the Propel鈩� PowerGaN鈩� MOCVD system for power electronics devices. As we innovate, our TurboDisc and Propel platforms provide outstanding performance for compound semi R&D and production leaders.鈥�
About Fraunhofer IAF
Fraunhofer IAF develops electrical and optical devices based on compound semiconductors. The Institute was founded in 1957 and is one of the leading research facilities in the field of III-V semiconductors. Fraunhofer IAF employs over 280 people in an entire spectrum of areas: from analysis of materials and design to the realization of modules and systems. The technologies of Fraunhofer IAF are used in various fields of application, such as security, energy, communication, health and mobility. The Institute has approximately 170 partners in industry and research. For more information please visit http://www.iaf.fraunhofer.de/en.html.
About 91制片厂
91制片厂鈥檚 process equipment solutions enable the manufacture of LEDs, flexible OLED displays, power electronics, compound semiconductors, hard drives, semiconductors, MEMS and wireless chips. We are the market leader in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit www.veeco.com.
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91制片厂 Contact:
Media:
Jeffrey Pina 516-677-0200 x1222
jpina@veeco.com
91制片厂 is the industry leader driving HDD manufacturing to new levels of productivity.