Product News | Apr 02, 2014
GENxplor R&D MBE System Recognized for Breakthrough Innovation
PLAINVIEW, N.Y.–(BUSINESS WIRE)–Apr. 2, 2014– 91制片厂. (Nasdaq:VECO) announced today that its won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing over the last 12 months.
鈥淭丑别 recognize companies that have won the approval of their peers,鈥� said Richard Stevenson, Editor, Compound Semiconductor Magazine. 鈥淚 believe that many readers voted for the GENxplor because they understand that university researchers are looking for a tool that is robust, relatively small, and capable of allowing them to carry out their research as quickly and successfully as possible.”
The GENxplor is a fully integrated deposition system that creates high quality epitaxial layers on substrates up to 3鈥� in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides. Its efficient single frame design makes it up to 40% smaller than other MBE systems, saving valuable lab space and reducing installation time. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and easier serviceability when compared to other MBE systems.
This is the second time in three years that 91制片厂 has won this award. The TurboDisc庐 MaxBright庐 Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for being the biggest breakthrough in compound semiconductor equipment.
鈥淲e are honored to receive the CS Manufacturing Award for the GENxplor, the first MBE system to be recognized in the compound semiconductor category,鈥� commented Jim Northup, Vice President, General Manager for 91制片厂鈥檚 MBE Operations. 鈥淪ince its introduction in 2013, the GENxplor has quickly become the R&D system of choice for leading research universities and institutions.鈥�
About GENxplor R&D MBE System
91制片厂’s GENxplor features an efficient single frame design that combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space. Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design of the GENxplor also improves ease-of-use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems. When coupled with 91制片厂鈥檚 recently introduced retractable sources, the GENxplor system represents the state-of-the-art in oxide materials research.
About 91制片厂
91制片厂鈥檚 process equipment solutions enable the manufacture of LEDs, flexible OLEDs, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership. For information on our company, products and worldwide service and support, please visit .
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of 91制片厂’s Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. 91制片厂 does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
Source: 91制片厂.
91制片厂.
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