91制片厂

Bibliography

91制片厂 CNT ALD customers are at the leading edge of ALD research around the world resulting in more publications than on any other commercial ALD platforms.

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Author(s): Bethge, Ole, Abermann, Stephan, Henkel, Christoph and Bertagnolli, Emmerich

Published: 2008

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Author(s): Tapily, K, Gu, D, Baumgart, H, Rigo, M and Seo, J

Published: 2010

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Author(s): Weatherup, Robert S, Baehtz, Carsten, Dlubak, Bruno, Bayer, Bernhard C, Kidambi, Piran R, Blume, Raoul, Schloegl, Robert and Hofmann, Stephan

Published: 2013

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Author(s): Chandiran, A K, Yella, A and Stefik, M

Published: 2013

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Author(s): Mani-Gonzalez, Pierre-Giovanni, Vazquez-Lepe, Milton-Oswaldo, Espinosa-Magan?a, Francisco and Herrera-Gomez, Alberto

Published: 2013

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Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

Author(s): Provine, J, Schindler, Peter, Kim, Yongmin, Walch, Steve P, Kim, Hyo Jin, Kim, Ki-Hyun and Prinz, Fritz B

Published: 2016

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Author(s): Katsia, E, Huby, N and Tallarida, G

Published: 2009

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Author(s): Yersak, Alexander S, Lewis, Ryan J, Tran, Jenny and Lee, Yung C

Published: 2016

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Author(s): Kang, Seung-Kyun, Hwang, Suk-Won, Cheng, Huanyu, Yu, Sooyoun, Kim, Bong Hoon, Kim, Jae-Hwan, Huang, Yonggang and Rogers, John A

Published: 2014

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Author(s): Nam, Chang-Yong, Stein, Aaron and Kisslinger, Kim

Published: 2015

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