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NEXUS IBE Ion Beam Etch System

Unsurpassed Uniformity over Multiple Energy and Process Angles

Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System. The IBE System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.

• Superior uniformity and improved etch depth control
• Highest throughput and reduced footprint for lowest cost of ownership
• Easily integrates with common technologies on world-class NEXUS hardware and software platform
• NEXUS Ion Source improves etch uniformity and process repeatability
• Also available with RF350 source for operations that have process-qualified use of RF350 source
• Platform can be cost-effectively field-upgraded to NEXUS Ion Source